"Using the optical microscopy imaging method for studying electromigrat" by Linghong Li

Date of Award

2005

Degree Type

Dissertation

Degree Name

Doctor of Philosophy in Physics

First Advisor

David Heskett

Abstract

Electromigration is a microscopic phenomenon involving electric field-induced diffusion, which is very relevant to damage in interconnects. A common method to monitor interconnect degradation is through electrical resistance measurements, which requires direct electrical contacts. It is desirable to develop non-contact methods to monitor electromigration damage formation. In this thesis, we propose a novel Optical Microscopy Imaging Method (OMIM), and we provide a theoretical description and experimental results. OMIM not only provides a new method for studying electromigration, but also provides a useful method for studying other micro-devices and materials in a non-contact mode.

Comments

This dissertation was scanned from microfilm. To report any image quality issues, please contact the URI library at digitalcommons-group@uri.edu as we may be able to fix the problem. The copyright in this dissertation belongs to the author.

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