Interference between bulk and boundary scattering in high quality films

Authors

S. Chatterjee, University of Rhode Island
A. E. Meyerovich, University of Rhode IslandFollow

Document Type

Article

Date of Original Version

6-7-2010

Abstract

Quasiclassical interference between bulk and boundary scattering channels in thin metal films with rough surfaces is discussed. The effective transport time, which is calculated beyond Mathiessen’s approximation, exhibits a nonanalytical dependence on the bulk relaxation time. Interference effects strongly affect the temperature (phonon scattering in the bulk) or concentration (impurity-scattering) dependencies of the conductivity. The results for large bulk free paths ℒ_b and large correlation radii (lateral sizes) R of surface inhomogeneities are described by simple analytical equations. At R² ~ aℒb we predict a crossover between two asymptotic regimes for interference contributions that are characterized by distinct temperature/concentration dependencies. Experimental implications of our results are discussed.

Citation/Publisher Attribution

Chattejee, S., & Meyerovich, A. E. (2010). Interference between bulk and boundary scattering in high quality films. Phys. Rev. B, 81(24), 245409. doi: 10.1103/PhysRevB.81.245409

Available at: http://dx.doi.org/10.1103/PhysRevB.81.245409

Publisher Statement

© 2010 The American Physical Society