Using atomic force microscopy for deep-submicron failure analysis
Document Type
Article
Date of Original Version
1-1-2001
Abstract
The feasibility study of using atomic force microscopy (AFM) for failure analysis in very deep submicron VLSI systems is presented. AFMs use a probe cantilever and tip to trace a square or rectangular area of a surface and generate an image. It is shown that AFM-based techniques hold strong potential for taking over failure analysis functions when feature sizes decrease to a point beyond FIB capabilities. AFMs can cut channels even at the micron scale, overlapping the range of FIB techniques.
Publication Title, e.g., Journal
IEEE Design and Test of Computers
Volume
18
Issue
1
Citation/Publisher Attribution
Lo, Jien Chung, William D. Armitage, and Corbet S. Johnson. "Using atomic force microscopy for deep-submicron failure analysis." IEEE Design and Test of Computers 18, 1 (2001): 10-18. doi: 10.1109/54.902818.