Refractive Index and Material Dispersion Interpolation of Doped Silica in the 0.6-1.8 µm Wavelength Region
Date of Original Version
In this paper, we propose an extension of the Claussius- Mossotti interpolation scheme, so that the refractive index and material dispersion of GeO2 and F-doped silica glasses, with doping concentrations different than that of published data, can be predicted in the 0.6-1.8 µm wavelength region. The new interpolation expression provides a well-behaved functional relationship for use in computer models which analyze propagation in single-mode fibers. The technique proposed is particularly powerful because it can be applied to any glass, whether single or multicomponent, having any other single dopant. © 1989 IEEE
IEEE Photonics Technology Letters
Sunak, Harish R., and Steven P. Bastien. "Refractive Index and Material Dispersion Interpolation of Doped Silica in the 0.6-1.8 µm Wavelength Region." IEEE Photonics Technology Letters 1, 6 (1989): 142-145. doi:10.1109/68.36016.