Sputtered TiN thin films for improved corrosion resistance
Date of Original Version
The general corrosion characteristics of TiN thin films deposited onto type 304 and 316 stainless steel by RF sputtering from a compound TiN target was investigated. In general, TiN film morphology and stoichiometry can vary considerably from film to film depending on deposition parameters and thus can play a major role in the corrosion behaviors of these films. Parametric models of the sputtering process were developed using statistial methods for design and analysis and studying the influence of a combination of variables on the properties of the TiN. The process parameters included RF power, N2 partial presure, total gas pressure, substrate temperature and bias. A number of optimum conditions based on different responses were selected and corrosion testing of these films was carried out potentiostatically in 0.1N HCI and 0.1M NaCl solutions at 25°C. © 1991.
Publication Title, e.g., Journal
Applied Surface Science
Bhardwaj, P., O. J. Gregory, K. Bragga, and M. H. Richman. "Sputtered TiN thin films for improved corrosion resistance." Applied Surface Science 48-49, C (1991): 555-566. doi: 10.1016/0169-4332(91)90390-6.