Title

Using atomic force microscopy for deep-submicron failure analysis

Document Type

Article

Date of Original Version

1-1-2001

Abstract

The feasibility study of using atomic force microscopy (AFM) for failure analysis in very deep submicron VLSI systems is presented. AFMs use a probe cantilever and tip to trace a square or rectangular area of a surface and generate an image. It is shown that AFM-based techniques hold strong potential for taking over failure analysis functions when feature sizes decrease to a point beyond FIB capabilities. AFMs can cut channels even at the micron scale, overlapping the range of FIB techniques.

Publication Title

IEEE Design and Test of Computers

Volume

18

Issue

1

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