Using atomic force microscopy for deep-submicron failure analysis
Date of Original Version
The feasibility study of using atomic force microscopy (AFM) for failure analysis in very deep submicron VLSI systems is presented. AFMs use a probe cantilever and tip to trace a square or rectangular area of a surface and generate an image. It is shown that AFM-based techniques hold strong potential for taking over failure analysis functions when feature sizes decrease to a point beyond FIB capabilities. AFMs can cut channels even at the micron scale, overlapping the range of FIB techniques.
IEEE Design and Test of Computers
Lo, Jien Chung, William D. Armitage, and Corbet S. Johnson. "Using atomic force microscopy for deep-submicron failure analysis." IEEE Design and Test of Computers 18, 1 (2001): 10-18. doi:10.1109/54.902818.